The problem of locate disturbance sources in power network is a critical task. Several methods based on multi point measurement techniques have been proposed in the last few years proving a good contribution on this filed. In this paper an event-based distributed measurement system for power network has been developed. The system adopts a hierarchical approach to monitor the power network: the sensing parts are measurement systems which perform the monitoring of Power Quality (PQ) parameters such as Total Harmonic Distortion (THD) and Root Mean Square (RMS); the management part is a supervisor node which uses an asynchronous symmetric communication protocol to exchange information with the devices connected to the network. When an abnormal behaviour has recorded, the measurement system notifies the supervisor node which begins to download the data from every smart sensor connected to it. To give much more freedom end flexibility to the sensors network, the smart sensors use the Web services technology to export its services and functionalities. In this paper, the main parts of the system are explained in details and some experimental results are reported.

The paper deals with a fast measurement technique of electromagnetic transients due to eddy currents in fast-cycled magnets for linear particle accelerators. First the context of the problem, related to the need for accurate control of the magnetic field quality in order to ensure the stability and performance of the particle beam in dynamic conditions (field ramps up to about 700 T/s) is outlined. Then the measurement technique and the setup employed are described by referring to a case study on a quadrupole magnet for Linac4, a new linear particle accelerator currently being built at CERN (European Organization for Nuclear Research). Finally, the results of the measurement campaigns carried out on a quadrupole magnet and on a reference air-core solenoid are discussed.

Reference hardness standard with HV1 – HV50 measuring range was installed at LIMS (Laboratory for Testing Mechanical Properties) at the end of 2007 with the aim of providing continuous improvement of the metrology infrastructure of Croatia. The evaluation of the measurement uncertainty is one of the most important tasks for establishing this reference standard. Therefore, the influence quantities contributing to the uncertainty were determined and the machine calibrated by direct and indirect method. In this paper the results of the measurements are presented and discussed.

The relation between the level of the inrush current of a single phase transformer and the phases of disconnecting the transformer from AC source and then connecting it to the same source is investigated. The measurement setup is presented. Results of the experiment are discussed.

A new method of imaging spectroscopic photometry enabling us to perform the complete optical characterization of thin films exhibiting area non-uniformity in optical parameters is presented. An original imaging spectroscopic photometer operating in the reflection mode at normal incidence is used to apply this method. A CCD camera serves as a detector in this photometer. Therefore the spectral dependences of the reflectance of the films characterized are simultaneously measured in small areas of the films surface corresponding to the individual pixels of the CCD camera. These areas form a matrix along a relatively large part of the films surface. The spectral reflectance measured by the individual pixels of the CCD camera is treated separately using the formulae for the reflectance corresponding to the uniform thin films. Using these formulae it is possible to determine the values of the local thickness and local optical constants for every small area of the matrix. In this way it is possible to determine distributions (maps) of the local thickness and local optical constants of the non-uniform films simultaneously in principle. The method described was used to characterize carbon-nitride thin films exhibiting only the thickness non-uniformity deposited by the method of dielectric barrier discharge onto the silicon single crystal substrates.