TARGET ANALYSIS BY FOCUSING ELLIPSOMETRY
U. Neuschaefer-Rube, W. Holzapfel, F. Wirth
Abstract:
Reflection ellipsometry is a proven optical measurement method often used to measure film thicknesses. Classical ellipsometers use an unfocused measurement beam, which causes a low lateral resolution in the order of 1 mm. To determine microstructures ellipsometrically (e.g. in the semiconductor industry), an improved lateral resolution in the order of micrometers is essential. We discuss the problems of focusing ellipsometry, occurring when a reflection ellipsometer is used to measure surface characteristics (topography, material). Different measurement setups are analyzed and compared. Simulating calculations show that particularly the measured values of the phase difference Δ are influenced by beam focusing. This leads to errors particularly in the attenuation index k of the surface material.
Keywords:
optical measurement, ellipsometry, beam focusing
Download:
IMEKO-WC-2000-TC2-P046.pdf
DOI:
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Event details
Event name:
XVI IMEKO World Congress
Title:

Measurement - Supports Science - Improves Technology - Protects Environment ... and Provides Employment - Now and in the Future

Place:
Vienna, AUSTRIA
Time:
25 September 2000 - 28 September 2000
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